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General Information About MOSIS Products Processes Prices Support User Group Events Job Openings News Work with MOSIS Getting Started Design and Test Requests Run Status NEW! Account Status Project Status Test Data Docs and Forms Documents Forms/Agreements Web Forms Quick Reference New Users Experienced Users Purchasing Agents Design and Test Academic Institutions Export Program Submit A Project Search MOSIS	austriamicrosystems (AMS) 0.35 Micron C35B4O1 CMOS-Opto Process 1. Process Description This CMOS-Opto process has 4 metal layers and 2 poly layers. A set of capacitors and resistors are available providing high performance digital and analog capabilities. A PiP module is available. The supply voltages are 3.3 V and 5 V. This process uses 14 µm epitaxial wafers. An optional 20 µm epitaxial substrate is available by request. 2. austriamicrosystems' Design Rules, Process Specifications, and SPICE Parameters To request this information, follow the instructions on the MOSIS web site at austriamicrosystems Design Rules, Process Specifications, and SPICE Parameters page. Access is restricted to approved customers who have a commercial account with MOSIS. Design rules supported by this technology Only the austriamicrosystems design rules will be supported for this technology. MOSIS Technology Codes The technology code for the C35B4O1 process is AMS_C35B4O1. Related Links MOSIS-Supported AMS Processes AMS Technology Codes & Layer Maps AMS Document Access
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