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AMIS Fabrication
Technology descriptions, MPW fabrication schedule, and vendor
document access procedures for the AMIS fabrication processes
available through MOSIS.
AMIS Fabrication Processes
The AMIS fabrication processes available through MOSIS include
1.5 µm CMOS, 0.7 µm high voltage CMOS,
0.5 µm CMOS, and 0.35 µm high voltage CMOS.
AMIS Fabrication Schedule
MOSIS offers a multiproject wafer (MPW) run schedule through AMIS. To
be considered ontime for an MPW run, layout and paperwork are due to
MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
AMIS Design Kits
AMIS Design Kits are available upon approval for MOSIS customers.
How To Access AMIS Documents
General instructions for accessing AMIS design rules and cell
libraries through MOSIS.
International Traffic in Arms Regulations (ITAR)
The AMIS ABN and C5 processes offered through MOSIS support designs
subject to export control under ITAR regulations.
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Related Links
MOSIS Fabrication Processes
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