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MOSIS MPW Fabrication Schedules
MOSIS is offering multiproject wafer (MPW) runs for the following
IC fabricators. To be considered ontime for an MPW run, layout and
paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the
date listed.
IBM Fabrication Schedule
The technologies included in the IBM MPW fabrication schedule range
from 32 nanometer to 0.18 µm in CMOS, and from
0.13 µm to 0.35 µm in SiGe BiCMOS. Additional
processes are available on taxi runs.
TSMC Fabrication Schedule
Multiproject wafer (MPW) runs available through TSMC include a range
of feature sizes from 40 nanometer to 0.35 µm, many
available in low power, low voltage, and high voltage.
ON Semiconductor Fabrication Schedule
The ON Semi fabrication schedule includes MPW runs in the following
processes: 0.7 µm high voltage
CMOS, 0.5 µm CMOS, and 0.35 µm high voltage
CMOS.
austriamicrosystems (AMS) Fabrication Schedule
The AMS fabrication schedule offered by MOSIS include
0.35 µm CMOS, high voltage CMOS, and SiGe BiCMOS processes.
Peregrine Fabrication Schedule
The Peregrine fabrication schedule offered by MOSIS include both
0.50 µm SOS process (FC and FA), and the two versions of
the 0.25 µm SOS process (GA and GC).
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Dedicated (COT) runs through MOSIS are also available. Dedicated runs
can be scheduled to start at any time. For more information about
participating on these or other runs through MOSIS, please contact
support@mosis.com.
Related Links
MOSIS Fabrication Processes
MOSIS Customer Support
MOSIS Products
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