Products > Fab Schedule
MOSIS MPW Fabrication Schedules
MOSIS scheduled multiproject wafer (MPW) fabrication runs.

MOSIS offers multiproject wafer (MPW) runs for the following IC fabricators. Designers need to plan design activities to meet the schedule constraints. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
IBM Fabrication Schedule
The technologies included in the IBM MPW fabrication schedule range from 32 nanometer to 0.18 µm in CMOS, and from 0.13 µm to 0.35 µm in SiGe BiCMOS. Additional processes are available on taxi runs.
TSMC Fabrication Schedule
Multiproject wafer (MPW) runs available through TSMC include a range of feature sizes from 40 nanometer to 0.35 µm, many available in low power, low voltage, and high voltage.
ON Semiconductor Fabrication Schedule
The ON Semi fabrication schedule includes MPW runs in the following processes: 0.7 µm high voltage CMOS, 0.5 µm CMOS, and 0.35 µm high voltage CMOS.
austriamicrosystems (AMS) Fabrication Schedule
The AMS fabrication schedule offered by MOSIS include 0.35 µm CMOS, high voltage CMOS, and SiGe BiCMOS processes.
Globalfoundries Fabrication Schedule
The processes offered by MOSIS through Globalfoundries range from 65 nanometer to 0.18 µm.
Tezzaron Fabrication Schedule
MOSIS offers access to Tezzaron two-tier 3DIC multiproject wafer (MPW) runs.
Peregrine Fabrication Schedule
The Peregrine fabrication schedule offered by MOSIS include both 0.50 µm SOS process (FC and FA), and the two versions of the 0.25 µm SOS process (GA and GC).
Dedicated (COT) runs through MOSIS are also available. Dedicated runs can be scheduled to start at any time. For more information about participating on these or other runs through MOSIS, please contact support@mosis.com.
Related Resources
| Fabrication Schedule |
|
MAY 14 GF GF_018 IBM 7RFSOI MAY 21 AMS C35B4O1 GF GF_65LPE IBM 7WL ON-SEMI C5F/C5N PEREGRINE GC TSMC 40 nm TSMC 45 nm MAY 28 IBM 8HP TSMC 40 nm TSMC 45 nm TSMC 65 nm MAY 29 AMS C35B4M3 AMS S35D4 TSMC 0.18 µm JUN 04 ON-SEMI I2T100 ON-SEMI I2T30 TSMC 0.18 µm TSMC 0.25 µm TSMC 90 nm JUN 11 GF GF_018 IBM 6WL IBM 7HV TSMC 0.13 µm TSMC 0.18 µm TSMC 65 nm JUN 18 IBM 7RF ON-SEMI I3T25 TSMC 0.25 µm TSMC 0.35 µm TSMC 90 nm JUN 25 GF GF_035 IBM 5PAE TSMC 0.18 µm TSMC 40 nm TSMC 45 nm TSMC 65 nm JUL 02 GF GF_013 TSMC 0.18 µm TSMC 0.25 µm TSMC 90 nm |

